- Kaito Noda, Yoshihiro Jagawa, Akio Fuwa, and Nílson Kunioshi, “Pressure Dependence of Rate Coefficients of Unimolecular and Chemical Activation Reactions Connected to the Potential Energy Wells of Si2H2Cl4, Si2Cl6, and Si2Cl4 via Rice-Ramsperger-Kassel-Marcus Calculations”, Journal of Physical Chemistry A 126, 8658–8673 (2022).
- Kaito Noda, Yoshihiro Jagawa, Akio Fuwa, and Nílson Kunioshi, “Pressure dependence of rate coefficients of unimolecular and chemical activation reactions connected to the potential energy wells of chlorinated monosilanes by RRKM calculations”, International Journal of Chemical Kinetics 53 (9), 1036–1049 (2021).
- Nílson Kunioshi, Sho Hagino, Akio Fuwa, and Katsunori Yamaguchi, “Novel pathways for elimination of chlorine atoms from growing Si(100) surfaces”, Applied Surface Science 441, 773–779 (2018)
- Nílson Kunioshi, Yoshiki Fujimura, Akio Fuwa, and Katsunori Yamaguchi, “Dynamics of reactions inhibiting epitaxial growth of Si(100) surfaces via interaction with hydrogen chloride”, Computational Materials Science 155, 28–35 (2018)
- Kaito Noda, Nílson Kunioshi, and Akio Fuwa, “Pressure dependence of rate coefficients for formation and dissociation of pentachlorodisilane and related chemical activation reactions”, International Journal of Chemical Kinetics 49 (8), 584–595 (2017)
- Keisuke Anzai, Nílson Kunioshi, and Akio Fuwa, “Analysis of the dynamics of reactions of SiCl2 at Si(100) surfaces”, Applied Surface Science 392, 410–417 (2017)
- Nílson Kunioshi, Yu Moriyama, and Akio Fuwa, “Kinetics of the conversion of silicon tetrachloride into trichlorosilane obtained through the temperature control along a plug-flow reactor”, International Journal of Chemical Kinetics 48, 45–57 (2016)
- Nílson Kunioshi, Keisuke Anzai, Harunobu Ushijima, and Akio Fuwa, “Effects of cluster size on calculation of activation energies of silicon surface reactions with H2 and HCl”, Journal of Crystal Growth 418, 115–119 (2015)